Laser-to-droplet alignment sensitivity relevant for laser-produced plasma sources of extreme ultraviolet light

Dynamics of high-repetition-rate laser plasma extreme ultraviolet sources from droplet targets

As a mass limited target the water droplet laser plasma source has been shown to have many attractive features as a continuous, almost debris-free source for extreme ultraviolet (EUV) and X-ray applications. Through a dual experimental and theoretical study, we analyze the interaction physics between the laser light and the target. The hydrodynamic laser plasma simulation code, Medusa103 is use...

Efficient laser-produced plasma extreme ultraviolet sources using grooved Sn targets

An efficient extreme ultraviolet EUV generation method has been developed with the use of a CO2 laser-produced plasma from a grooved target. A 5% conversion efficiency from laser to 13.5 nm photons was obtained with the use of grooves in a tin target or by repeated laser pulse shots at the same target position. Modeling studies proved that the groove target controls the hydrodynamic expansion o...

Interaction of Intense Laser Pulses with Droplet and Cluster Sources: Application to Extreme Ultraviolet Lithography and Plasma Waveguide Generation

Title of Document: INTERACTION OF INTENSE LASER PULSES WITH DROPLET AND CLUSTER SOURCES: APPLICATION TO EXTREME ULTRAVIOLET LITHOGRAPHY AND PLASMA WAVEGUIDE GENERATION Hua Sheng, Doctor of Philosophy, 2006 Directed By: Professor Howard M. Milchberg Department of Electrical and Computer Engineering & Institute for Physical Science and Technology Several topics were studied in the interaction of ...

Laser plasma source for extreme ultraviolet lithography using a water droplet target

Mitigation of fast ions from laser-produced Sn plasma for an extreme ultraviolet lithography source

The authors present evidence of the reduction of fast ion energy from laser-produced Sn plasma by introducing a low energy prepulse. The energy of Sn ions was reduced from more than 5 keV to less than 150 eV nearly without loss of the in-band conversion from laser to 13.5 nm extreme ultraviolet EUV emission as compared with that of a single pulse. The reason may come from the interaction of the...